Very low temperature epitaxy of group-IV semiconductors for use in FinFET, stacked nanowires and monolithic 3D integration

C. Porret*, A. Hikavyy, J. F.Gomez Granados, S. Baudot, A. Vohra, B. Kunert, B. Douhard, A. Sammak, G. Scappucci, More Authors

*Corresponding author for this work

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