What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe3 and oxygen?

Hao Van Bui*, Anh Phan Nguyen, Manh Duc Dang, Truong Duc Dinh, Patricia J. Kooyman, J.R. van Ommen

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (SciVal)
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Abstract

We explore the low-temperature limit of atomic layer deposition of Pt using MeCpPtMe3 and O2. We reveal that by supplying a sufficiently high O2 exposure, highly dispersed and thermally stable Pt sub-nanometer clusters can be deposited onto the surface of P25 TiO2 nanoparticles even at room temperature by atmospheric-pressure ALD.
Original languageEnglish
Pages (from-to)14045-14048
Number of pages4
JournalChemical Communications
Volume60
Issue number95
DOIs
Publication statusPublished - 2024

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