X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films

L Jiang, AG Fitzgerald, MJ Rose, R Cheung, B Rong, EWJM van der Drift

Research output: Contribution to journalArticleScientificpeer-review

24 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)144-148
Number of pages5
JournalApplied Surface Science
Publication statusPublished - 2002


  • academic journal papers
  • ZX CWTS JFIS < 1.00

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