X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films

L Jiang, AG Fitzgerald, MJ Rose, R Cheung, B Rong, EWJM van der Drift

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{ca6192253e0a48209c790cefc0ba8465,

title = "X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films",

keywords = "academic journal papers, ZX CWTS JFIS < 1.00",

author = "L Jiang and AG Fitzgerald and MJ Rose and R Cheung and B Rong and {van der Drift}, EWJM",

year = "2002",

language = "Undefined/Unknown",

volume = "193",

pages = "144--148",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

}

TY - JOUR

T1 - X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films

AU - Jiang, L

AU - Fitzgerald, AG

AU - Rose, MJ

AU - Cheung, R

AU - Rong, B

AU - van der Drift, EWJM

PY - 2002

Y1 - 2002

KW - academic journal papers

KW - ZX CWTS JFIS < 1.00

M3 - Article

SN - 0169-4332

VL - 193

SP - 144

EP - 148

JO - Applied Surface Science

JF - Applied Surface Science

ER -