@inproceedings{42561ddea90f45818c22f20bbc0d5340,
title = "Automatic process design for 3D thick-film grayscale photolithography",
abstract = "A novel process optimization tool for grayscale lithography is developed and demonstrated to fabricate three-dimensional (3D) microstructures using thick-film photoresists. For the first time, the two process parameters in grayscale lithography: exposure dose profile and development time are determined automatically for a user-specified target 3D profile. This provides an inexpensive and effective alternative to conventional trialand-error based process design. The optimized parameters were verified by fabricating various 3D microstructures and the experiments revealed good quantitative agreement with the target profile . KEYWORDS Grayscale Photolithography, 3D Microstructuring, Design Optimization, Automatic Process Design",
keywords = "Conf.proc. > 3 pag",
author = "{van Kempen}, FCM and Y Hirai and {van Keulen}, F and O Tabata",
year = "2013",
doi = "10.1109/Transducers.2013.6627095",
language = "English",
isbn = "978-1-4673-5983-2/13",
publisher = "IEEE Society",
pages = "1625--1628",
editor = "JR Morante and C Hierold",
booktitle = "Proceedings of the 17th Conference on Solid-State Sensors, Actuators & Microsystems 2013",
note = "Transducers 2013 & Eurosensors XXVII, Barcelona, Spain ; Conference date: 16-06-2013 Through 20-06-2013",
}