Dry etching of SiC in inductively coupled Cl-2/Ar plasma

LD Jiang, NOV Plank, MA Blauw, R Cheung, EWJM van der Drift

Research output: Contribution to journalArticleScientificpeer-review

53 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)1809-1814
Number of pages6
JournalJournal of Physics D: Applied Physics
Issue number13
Publication statusPublished - 2004


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