Dry etching of SiC in inductively coupled Cl-2/Ar plasma

LD Jiang, NOV Plank, MA Blauw, R Cheung, EWJM van der Drift

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1809-1814
Number of pages	6
Journal	Journal of Physics D: Applied Physics
Volume	37
Issue number	13
Publication status	Published - 2004

Keywords

@article{b6e4449171874141aef3ff2eb0087a8b,

title = "Dry etching of SiC in inductively coupled Cl-2/Ar plasma",

keywords = "academic journal papers, ZX CWTS JFIS < 1.00",

author = "LD Jiang and NOV Plank and MA Blauw and R Cheung and {van der Drift}, EWJM",

year = "2004",

language = "Undefined/Unknown",

volume = "37",

pages = "1809--1814",

journal = "Journal of Physics D: Applied Physics",

issn = "0022-3727",

publisher = "IOP Publishing",

number = "13",

}

TY - JOUR

T1 - Dry etching of SiC in inductively coupled Cl-2/Ar plasma

AU - Jiang, LD

AU - Plank, NOV

AU - Blauw, MA

AU - Cheung, R

AU - van der Drift, EWJM

PY - 2004

Y1 - 2004

KW - academic journal papers

KW - ZX CWTS JFIS < 1.00

M3 - Article

SN - 0022-3727

VL - 37

SP - 1809

EP - 1814

JO - Journal of Physics D: Applied Physics

JF - Journal of Physics D: Applied Physics

IS - 13

ER -