Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films.

KF Feenstra, PFA Alkemade, E Algra, REI Schropp, WF van der Weg

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	341-351
Number of pages	11
Journal	Progress in Photovoltaics: research and applications
Volume	7
Publication status	Published - 1999

Research and Applications

Cite this

@article{8a33df04527d4518a431684ae1942cdb,

title = "Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films.",

author = "KF Feenstra and PFA Alkemade and E Algra and REI Schropp and {van der Weg}, WF",

note = "Research and Applications",

year = "1999",

language = "Undefined/Unknown",

volume = "7",

pages = "341--351",

journal = "Progress in Photovoltaics: research and applications",

issn = "1062-7995",

publisher = "John Wiley & Sons",

}

TY - JOUR

T1 - Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films.

AU - Feenstra, KF

AU - Alkemade, PFA

AU - Algra, E

AU - Schropp, REI

AU - van der Weg, WF

N1 - Research and Applications

PY - 1999

Y1 - 1999

M3 - Article

SN - 1062-7995

VL - 7

SP - 341

EP - 351

JO - Progress in Photovoltaics: research and applications

JF - Progress in Photovoltaics: research and applications

ER -