Effect of the deposition technique on the metallurgy and hydrogen storage characteristics of metastable MgyTi(1-y) thin films

P. Vermeulen, R. A. H. Niessen, D. M. Borsa, B. Dam, R. Griessen, P. H. L. Notten

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Pages (from-to)	A520-A523
Journal	Electrochemical and Solid-State Letters
Volume	9
Issue number	11
DOIs	https://doi.org/10.1149/1.2345548
Publication status	Published - 2006

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title = "Effect of the deposition technique on the metallurgy and hydrogen storage characteristics of metastable MgyTi(1-y) thin films",

author = "P. Vermeulen and Niessen, {R. A. H.} and Borsa, {D. M.} and B. Dam and R. Griessen and Notten, {P. H. L.}",

year = "2006",

doi = "10.1149/1.2345548",

language = "English",

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pages = "A520--A523",

journal = "Electrochemical and Solid-State Letters",

issn = "1099-0062",

publisher = "Electrochemical Society, Inc.",

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T1 - Effect of the deposition technique on the metallurgy and hydrogen storage characteristics of metastable MgyTi(1-y) thin films

AU - Vermeulen, P.

AU - Niessen, R. A. H.

AU - Borsa, D. M.

AU - Dam, B.

AU - Griessen, R.

AU - Notten, P. H. L.

PY - 2006

Y1 - 2006

U2 - 10.1149/1.2345548

DO - 10.1149/1.2345548

M3 - Article

SN - 1099-0062

VL - 9

SP - A520-A523

JO - Electrochemical and Solid-State Letters

JF - Electrochemical and Solid-State Letters

IS - 11

ER -