TY - JOUR
T1 - Enhancing colloid stability of polymer microspheres in water through SiO2 coating
T2 - Effects of coating cycles and surface coverage
AU - Kamphorst, Rens
AU - Wanjari, Pratyush
AU - Saedy, Saeed
AU - van Dam, Julia F.K.
AU - Thijssen, Arjan
AU - Brüner, Philipp
AU - Grehl, Thomas
AU - Meesters, Gabrie M.H.
AU - van Ommen, J. Ruud
PY - 2024
Y1 - 2024
N2 - In this study, we investigated the wettability and agglomeration characteristics of polymer microspheres coated with low-temperature deposited SiO2 in a fluidized bed atomic layer deposition (ALD) setup. Surface characterization revealed the presence of a significant amount of deposited Si-OH groups within the first cycles. A drastic decrease in agglomerate size, water contact angle (WCA), and droplet absorption time of the powder was observed when coating was applied. Furthermore, we observed an increase in the amount of Si-OH present on the particle surface with increasing coating cycles, while no significant improvement in water affinity was found after the first coating cycles. Our findings suggest that surface coverage is the primary factor in improving the colloid stability of particles, coated at low temperatures. The low temperature operation of our system introduced a chemical vapor deposition (CVD) component to our coating process, which allowed full surface coverage to be achieved within the first two coating cycles.
AB - In this study, we investigated the wettability and agglomeration characteristics of polymer microspheres coated with low-temperature deposited SiO2 in a fluidized bed atomic layer deposition (ALD) setup. Surface characterization revealed the presence of a significant amount of deposited Si-OH groups within the first cycles. A drastic decrease in agglomerate size, water contact angle (WCA), and droplet absorption time of the powder was observed when coating was applied. Furthermore, we observed an increase in the amount of Si-OH present on the particle surface with increasing coating cycles, while no significant improvement in water affinity was found after the first coating cycles. Our findings suggest that surface coverage is the primary factor in improving the colloid stability of particles, coated at low temperatures. The low temperature operation of our system introduced a chemical vapor deposition (CVD) component to our coating process, which allowed full surface coverage to be achieved within the first two coating cycles.
KW - Agglomeration
KW - Atomic layer deposition
KW - Chemical vapor deposition
KW - Surface functionalization
KW - Wettability
UR - http://www.scopus.com/inward/record.url?scp=85182233378&partnerID=8YFLogxK
U2 - 10.1016/j.surfin.2024.103852
DO - 10.1016/j.surfin.2024.103852
M3 - Article
AN - SCOPUS:85182233378
SN - 2468-0230
VL - 45
JO - Surfaces and Interfaces
JF - Surfaces and Interfaces
M1 - 103852
ER -