Enhancing colloid stability of polymer microspheres in water through SiO2 coating: Effects of coating cycles and surface coverage

Rens Kamphorst*, Pratyush Wanjari, Saeed Saedy, Julia F.K. van Dam, Arjan Thijssen, Philipp Brüner, Thomas Grehl, Gabrie M.H. Meesters, J. Ruud van Ommen

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)
31 Downloads (Pure)

Abstract

In this study, we investigated the wettability and agglomeration characteristics of polymer microspheres coated with low-temperature deposited SiO2 in a fluidized bed atomic layer deposition (ALD) setup. Surface characterization revealed the presence of a significant amount of deposited Si-OH groups within the first cycles. A drastic decrease in agglomerate size, water contact angle (WCA), and droplet absorption time of the powder was observed when coating was applied. Furthermore, we observed an increase in the amount of Si-OH present on the particle surface with increasing coating cycles, while no significant improvement in water affinity was found after the first coating cycles. Our findings suggest that surface coverage is the primary factor in improving the colloid stability of particles, coated at low temperatures. The low temperature operation of our system introduced a chemical vapor deposition (CVD) component to our coating process, which allowed full surface coverage to be achieved within the first two coating cycles.

Original languageEnglish
Article number103852
Number of pages11
JournalSurfaces and Interfaces
Volume45
DOIs
Publication statusPublished - 2024

Keywords

  • Agglomeration
  • Atomic layer deposition
  • Chemical vapor deposition
  • Surface functionalization
  • Wettability

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