Extended-source interferometry for at-wavelength testing of EUV optics.

M Visser, M Dekker, PE Hegeman, JJM Braat

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

49 Citations (Scopus)
Original languageUndefined/Unknown
Title of host publicationEmerging Lithographic Technologies III.
EditorsY Vladimirsky
PublisherSPIE
Pages253-264
Number of pages12
Publication statusPublished - 1999

Publication series

Name
PublisherSPIE
Name
Volume3676

Cite this