Extended-source interferometry for at-wavelength testing of EUV optics.

M Visser, M Dekker, PE Hegeman, JJM Braat

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Emerging Lithographic Technologies III.
Editors	Y Vladimirsky
Publisher	SPIE
Pages	253-264
Number of pages	12
Publication status	Published - 1999

Name
Publisher	SPIE

Name
Volume	3676

Cite this

@inproceedings{5f97cc1a783c48188b49551962c8a0b5,

title = "Extended-source interferometry for at-wavelength testing of EUV optics.",

author = "M Visser and M Dekker and PE Hegeman and JJM Braat",

year = "1999",

language = "Undefined/Unknown",

publisher = "SPIE",

pages = "253--264",

editor = "Y Vladimirsky",

booktitle = "Emerging Lithographic Technologies III.",

address = "United States",

}