High-rate deposition of microcrystalline silicon with an expanding thermal plasma

C Smit; A Klaver; BA Korevaar; AMHN Petit; DL Williamson; RACMM van Swaaij; MCM van de Sanden

doi:10.1016/j.tsf.2005.06.032

High-rate deposition of microcrystalline silicon with an expanding thermal plasma

C Smit, A Klaver, BA Korevaar, AMHN Petit, DL Williamson, RACMM van Swaaij, MCM van de Sanden

Electronic Components, Technology and Materials

Research output: Contribution to journal › Article › Scientific › peer-review

11 Citations (Scopus)

Original language	Undefined/Unknown
Pages (from-to)	280-293
Number of pages	14
Journal	Thin Solid Films
Volume	491
Issue number	1-2
DOIs	https://doi.org/10.1016/j.tsf.2005.06.032
Publication status	Published - 2005

Keywords

academic journal papers
ZX CWTS 1.00 <= JFIS < 3.00

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1016/j.tsf.2005.06.032

Cite this

@article{8a615984faba426a966a92f57d185c45,

title = "High-rate deposition of microcrystalline silicon with an expanding thermal plasma",

keywords = "academic journal papers, ZX CWTS 1.00 <= JFIS < 3.00",

author = "C Smit and A Klaver and BA Korevaar and AMHN Petit and DL Williamson and {van Swaaij}, RACMM and {van de Sanden}, MCM",

year = "2005",

doi = "10.1016/j.tsf.2005.06.032",

language = "Undefined/Unknown",

volume = "491",

pages = "280--293",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "1-2",

}

TY - JOUR

T1 - High-rate deposition of microcrystalline silicon with an expanding thermal plasma

AU - Smit, C

AU - Klaver, A

AU - Korevaar, BA

AU - Petit, AMHN

AU - Williamson, DL

AU - van Swaaij, RACMM

AU - van de Sanden, MCM

PY - 2005

Y1 - 2005

KW - academic journal papers

KW - ZX CWTS 1.00 <= JFIS < 3.00

U2 - 10.1016/j.tsf.2005.06.032

DO - 10.1016/j.tsf.2005.06.032

M3 - Article

SN - 0040-6090

VL - 491

SP - 280

EP - 293

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

ER -