Improved PECVD processed hydrogenated germanium films through temperature induced densification

Thierry de Vrijer, Julian E.C. van Dingen, Paul J. Roelandschap, Koos Roodenburg, Arno H.M. Smets

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)
26 Downloads (Pure)

Abstract

Amorphous and nano-crystalline germanium is of potential interest for a wide range of electronic, optical, opto-electronic and photovoltaic applications. In this work the influence of deposition temperature on hydrogenated germanium (Ge:H) films was characterized, using over 200 Ge:H and over 70 SiGe:H films. The demonstrated temperature-induced densification of Ge:H films resulted in more stable films with a lower bandgap energy and dark conductivity and higher activation energy.

Original languageEnglish
Article number106285
Pages (from-to)1-7
Number of pages7
JournalMaterials Science in Semiconductor Processing
Volume138
DOIs
Publication statusPublished - 2022

Keywords

  • Amorphous germanium
  • Chemical stability
  • Hydrogenated germanium
  • PECVD
  • Temperature densification
  • Thin film

Fingerprint

Dive into the research topics of 'Improved PECVD processed hydrogenated germanium films through temperature induced densification'. Together they form a unique fingerprint.

Cite this