Interface roughness in Mo/Si multilayers

I Nedelcu; RWE van de Kruijs; AE Yakshin; FD Tichelaar; E Zoethout; E Louis; H Enkisch; S Muellender; F Bijkerk

Interface roughness in Mo/Si multilayers

I Nedelcu, RWE van de Kruijs, AE Yakshin, FD Tichelaar, E Zoethout, E Louis, H Enkisch, S Muellender, F Bijkerk

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	434-438
Number of pages	5
Journal	Thin Solid Films
Volume	515
Publication status	Published - 2006

Keywords

CWTS 0.75 <= JFIS < 2.00

Cite this

@article{927cfa36f55d4ebfbc7bfa5c61fa2910,

title = "Interface roughness in Mo/Si multilayers",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "I Nedelcu and {van de Kruijs}, RWE and AE Yakshin and FD Tichelaar and E Zoethout and E Louis and H Enkisch and S Muellender and F Bijkerk",

year = "2006",

language = "Undefined/Unknown",

volume = "515",

pages = "434--438",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}