Kinetics and Crystal orientation dependence in High Aspect Ratio Silicon Dry Etching.

MA Blauw, T Zijlstra, RA Bakker, EWJM van der Drift

Research output: Contribution to journalArticleScientificpeer-review

56 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)3453-3461
Number of pages9
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Issue number6
Publication statusPublished - 2000


  • ZX Int.klas.verslagjaar < 2002

Cite this