Kinetics and Crystal orientation dependence in High Aspect Ratio Silicon Dry Etching.

MA Blauw, T Zijlstra, RA Bakker, EWJM van der Drift

Research output: Contribution to journalArticleScientificpeer-review

48 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)3453-3461
Number of pages9
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume18
Issue number6
Publication statusPublished - 2000

Keywords

  • ZX Int.klas.verslagjaar < 2002

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