In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.
|ASML Netherlands BV, Veldhoven NL
|Published - 2009
Bibliographical noteASML Netherlands BV, Veldhoven NL