Lithographic Apparatus and Device Manufacturing Method

JCH Mulkens; RH Munnig Schmidt

Lithographic Apparatus and Device Manufacturing Method

JCH Mulkens (Inventor), RH Munnig Schmidt (Inventor)

Mechatronic Systems Design

Research output: Patent

Abstract

In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.

Original language	Undefined/Unknown
Patent number	12/493,592
IPC	ASML Netherlands BV, Veldhoven NL
Priority date	29/06/09
Publication status	Published - 2009

Bibliographical note

ASML Netherlands BV, Veldhoven NL

Keywords

Octrooi

Cite this

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title = "Lithographic Apparatus and Device Manufacturing Method",

abstract = "In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.",

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author = "JCH Mulkens and {Munnig Schmidt}, RH",

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AU - Munnig Schmidt, RH

N1 - ASML Netherlands BV, Veldhoven NL

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N2 - In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.

AB - In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.

KW - Octrooi

M3 - Patent

M1 - 12/493,592

ER -