Lithographic Apparatus and Device Manufacturing Method

JCH Mulkens (Inventor), RH Munnig Schmidt (Inventor)

Research output: Patent


In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.
Original languageUndefined/Unknown
Patent number12/493,592
IPCASML Netherlands BV, Veldhoven NL
Priority date29/06/09
Publication statusPublished - 2009

Bibliographical note

ASML Netherlands BV, Veldhoven NL


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