Local extraction of base and termal resistance of bipolar transistors

R Setekera, R van der Toorn, W Kloosterman

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	Proceedings IEEE 2013 Bipolar/BiCMOS Circuit and Technology Meeting
Editors	B Hecht, BYC Lie
Place of Publication	Piscataway, NJ, USA
Publisher	IEEE
Pages	1-4
Number of pages	4
Publication status	Published - 2013
Event	2013 IEEE BCTM, Bordeaux, France - Piscataway, NJ, USA Duration: 30 Sept 2013 → 3 Oct 2014

Name
Publisher	IEEE

Conference	2013 IEEE BCTM, Bordeaux, France
Period	30/09/13 → 3/10/14

Keywords

@inproceedings{43ae56b5e68e4efabc489ee47d448af3,

title = "Local extraction of base and termal resistance of bipolar transistors",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "R Setekera and {van der Toorn}, R and W Kloosterman",

year = "2013",

language = "English",

publisher = "IEEE",

pages = "1--4",

editor = "B Hecht and BYC Lie",

booktitle = "Proceedings IEEE 2013 Bipolar/BiCMOS Circuit and Technology Meeting",

address = "United States",

note = "2013 IEEE BCTM, Bordeaux, France ; Conference date: 30-09-2013 Through 03-10-2014",

}

Local extraction of base and termal resistance of bipolar transistors. / Setekera, R; van der Toorn, R; Kloosterman, W.
Proceedings IEEE 2013 Bipolar/BiCMOS Circuit and Technology Meeting. ed. / B Hecht; BYC Lie. Piscataway, NJ, USA: IEEE, 2013. p. 1-4.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Local extraction of base and termal resistance of bipolar transistors

AU - Setekera, R

AU - van der Toorn, R

AU - Kloosterman, W

PY - 2013

Y1 - 2013

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SP - 1

EP - 4

BT - Proceedings IEEE 2013 Bipolar/BiCMOS Circuit and Technology Meeting

A2 - Hecht, B

A2 - Lie, BYC

PB - IEEE

CY - Piscataway, NJ, USA

T2 - 2013 IEEE BCTM, Bordeaux, France

Y2 - 30 September 2013 through 3 October 2014

ER -