Low-pressure chemical vapor deposition of pureB layers on silicon for p+n junction formation

KRC Mok, V Mohammadi, LK Nanver, WB De Boer, AHG Vlooswijk

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

1 Citation (Scopus)
Original languageEnglish
Title of host publication12th International Workshop on Junction Technology (IWJT 2012), Shanghai, China
Pages113-116
Number of pages4
DOIs
Publication statusPublished - 2012

Keywords

  • Conf.proc. > 3 pag

Cite this

Mok, KRC., Mohammadi, V., Nanver, LK., De Boer, WB., & Vlooswijk, AHG. (2012). Low-pressure chemical vapor deposition of pureB layers on silicon for p+n junction formation. In 12th International Workshop on Junction Technology (IWJT 2012), Shanghai, China (pp. 113-116) https://doi.org/10.1109/IWJT.2012.6212822