Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist

VA Sidorkin; PFA Alkemade; HWM Salemink; R. Schmits; EWJM van der Drift

doi:DOI:10.1116/1.3263171

Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist

VA Sidorkin, PFA Alkemade, HWM Salemink, R. Schmits, EWJM van der Drift

QN/Kavli Nanolab Delft

Research output: Contribution to journal › Article › Scientific › peer-review

1 Citation (Scopus)

Original language	Undefined/Unknown
Pages (from-to)	2503-2507
Number of pages	5
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	B27
Issue number	6
DOIs	https://doi.org/DOI:10.1116/1.3263171
Publication status	Published - 2009

Keywords

academic journal papers
CWTS JFIS < 0.75

Access to Document

DOI:10.1116/1.3263171

Cite this

@article{ea7d006091dc4f9995e9becf23abc022,

title = "Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist",

keywords = "academic journal papers, CWTS JFIS < 0.75",

author = "VA Sidorkin and PFA Alkemade and HWM Salemink and R. Schmits and {van der Drift}, EWJM",

year = "2009",

doi = "DOI:10.1116/1.3263171",

language = "Undefined/Unknown",

volume = "B27",

pages = "2503--2507",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist. / Sidorkin, VA; Alkemade, PFA; Salemink, HWM et al.
In: Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures, Vol. B27, No. 6, 2009, p. 2503-2507.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist

AU - Sidorkin, VA

AU - Alkemade, PFA

AU - Salemink, HWM

AU - Schmits, R.

AU - van der Drift, EWJM

PY - 2009

Y1 - 2009

KW - academic journal papers

KW - CWTS JFIS < 0.75

U2 - DOI:10.1116/1.3263171

DO - DOI:10.1116/1.3263171

M3 - Article

SN - 1071-1023

VL - B27

SP - 2503

EP - 2507

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 6

ER -