Neutron depth profiling (NDP) and thermal helium desorption spectrometry (THDS) applied to MeV helium implanted silicon

A van Veen, F Labohm

Research output: Book/Report › Report › Professional

IRI-131-99-029

Keywords

@book{60571c72da0f4999b2f355ffe0d449bf,

title = "Neutron depth profiling (NDP) and thermal helium desorption spectrometry (THDS) applied to MeV helium implanted silicon",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "{van Veen}, A and F Labohm",

note = "IRI-131-99-029",

year = "1999",

language = "Undefined/Unknown",

publisher = "Unknown Publisher",

}

TY - BOOK

T1 - Neutron depth profiling (NDP) and thermal helium desorption spectrometry (THDS) applied to MeV helium implanted silicon

AU - van Veen, A

AU - Labohm, F

N1 - IRI-131-99-029

PY - 1999

Y1 - 1999

KW - ZX Int.klas.verslagjaar < 2002

M3 - Report

BT - Neutron depth profiling (NDP) and thermal helium desorption spectrometry (THDS) applied to MeV helium implanted silicon

PB - Unknown Publisher

ER -