New insights in microcrystalline silicon deposition with expanding thermal plasma chemical vapour deposition

RACMM van Swaaij, R Jimenez Zambrano, C Smit, MCM van de Sanden

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	933-936
Number of pages	4
Journal	Journal of Non-Crystalline Solids
Volume	352
Issue number	9-20
Publication status	Published - 2006

Keywords

This output contributes to the following UN Sustainable Development Goals (SDGs)

@article{e0cf236d96204c2db9093c93cd1cf4c6,

title = "New insights in microcrystalline silicon deposition with expanding thermal plasma chemical vapour deposition",

keywords = "Elektrotechniek, Techniek, academic journal papers, CWTS 0.75 <= JFIS < 2.00",

author = "{van Swaaij}, RACMM and {Jimenez Zambrano}, R and C Smit and {van de Sanden}, MCM",

year = "2006",

language = "Undefined/Unknown",

volume = "352",

pages = "933--936",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier",

number = "9-20",

}

TY - JOUR

T1 - New insights in microcrystalline silicon deposition with expanding thermal plasma chemical vapour deposition

AU - van Swaaij, RACMM

AU - Jimenez Zambrano, R

AU - Smit, C

AU - van de Sanden, MCM

PY - 2006

Y1 - 2006

KW - Elektrotechniek

KW - Techniek

KW - academic journal papers

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 0022-3093

VL - 352

SP - 933

EP - 936

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - 9-20

ER -