INIS
atmospheres
20%
calcium
100%
cross sections
40%
crystallization
100%
crystals
20%
doped materials
20%
emission
20%
energy
20%
europium
100%
films
60%
heat treatments
20%
images
20%
layers
100%
luminescence
60%
magnetrons
20%
nitrides
80%
oxidation
100%
oxides
20%
processing
100%
scanning electron microscopy
20%
silicon
20%
silicon nitrides
100%
sputtering
20%
substrates
20%
surfaces
20%
thickness
60%
thin films
100%
x-ray diffraction
40%
x-ray spectroscopy
20%
Material Science
Amorphous Material
20%
Calcium
100%
Crystalline Material
20%
Crystallization
100%
Diffraction Measurement
20%
Europium
100%
Film
20%
Luminescence
40%
Magnetron Sputtering
20%
Nitride Compound
80%
Oxidation Reaction
100%
Oxide Compound
20%
Protective Atmosphere
20%
Rapid Thermal Processing
100%
Scanning Electron Microscopy
20%
Silicon Nitride
100%
Silicon Wafer
20%
Surface
20%
Temperature
20%
X Ray Diffraction Analysis
20%
X-Ray Diffraction
20%