Pure boron chemical vapor deposited layers; A new material for silicon device processing

LK Nanver, TLM Scholtes, F Sarubbi, WB De Boer, G Lorito, A Sakic, S Milosavljevic, C Mok Kai Rine, L Shi, S Nihtianov, K Buisman

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

15 Citations (Scopus)
Original languageEnglish
Title of host publicationProceedings 18th IEEE Conference on Advanced Thermal Processing of Semiconductors - RTP 2010
EditorsB Lojek et al
Place of PublicationPiscataway, NJ, USA
PublisherIEEE Society
Pages136-139
Number of pages4
ISBN (Print)978-1-4244-8393-3
DOIs
Publication statusPublished - 2010
Event18th IEEE Conference on Advanced Thermal Processing of Semiconductors - RTP 2010, Gainesville, FL, USA - Piscataway, NJ, USA
Duration: 28 Sep 20101 Oct 2010

Publication series

Name
PublisherIEEE

Conference

Conference18th IEEE Conference on Advanced Thermal Processing of Semiconductors - RTP 2010, Gainesville, FL, USA
Period28/09/101/10/10

Keywords

  • Conf.proc. > 3 pag

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