Reactive Ion Etchin of metal stack consisting of an aluminium ally, WGe barrier and Ti adhesion layer

E Sabouret, C Schaffnit, JF Jongste, GCAM Janssen, S Radelaar

    Research output: Contribution to journalArticlepeer-review

    Original languageUndefined/Unknown
    Pages (from-to)353-363
    Number of pages11
    JournalMicroelectronic Engineering
    Volume37/38
    Publication statusPublished - 1997

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