Resistance Changes Induced by the Formation of a Single Void/Hillock During Electromigration

AH Verbruggen, MJC van de Homberg, LC Jacobs, AJ Kalkman, JR Kraayeveld, S Radelaar

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	AIP Conference Proceedings
Editors	H Okabayashi, PS Ho, S Shingubara
Pages	135-146
Number of pages	12
Publication status	Published - 1998

Name

Name
Volume	418

Cite this

@inproceedings{6e10ebeca0fc480581f751d582629328,

title = "Resistance Changes Induced by the Formation of a Single Void/Hillock During Electromigration",

author = "AH Verbruggen and {van de Homberg}, MJC and LC Jacobs and AJ Kalkman and JR Kraayeveld and S Radelaar",

year = "1998",

language = "Undefined/Unknown",

isbn = "1563966824",

pages = "135--146",

editor = "H Okabayashi and PS Ho and S Shingubara",

booktitle = "AIP Conference Proceedings",

}

TY - GEN

T1 - Resistance Changes Induced by the Formation of a Single Void/Hillock During Electromigration

AU - Verbruggen, AH

AU - van de Homberg, MJC

AU - Jacobs, LC

AU - Kalkman, AJ

AU - Kraayeveld, JR

AU - Radelaar, S

PY - 1998

Y1 - 1998

M3 - Conference contribution

SN - 1563966824

SP - 135

EP - 146

BT - AIP Conference Proceedings

A2 - Okabayashi, H

A2 - Ho, PS

A2 - Shingubara, S

ER -