Reticle masking system positioned below the reticle in a scanning lithography system

RH Munnig Schmidt (Inventor), G Schothorst (Inventor), J. Eijk (Inventor), E Loopstra (Inventor), FGP Peeters (Inventor)

Research output: Patent

Original languageUndefined/Unknown
Patent numberUS 7,423,730 B2
IPCref. P-1568.010-US
Priority date9/09/08
Publication statusPublished - 2008

Keywords

  • Octrooi

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