Reticle masking system positioned below the reticle in a scanning lithography system

RH Munnig Schmidt (Inventor), G Schothorst (Inventor), J. Eijk (Inventor), E Loopstra (Inventor), FGP Peeters (Inventor)

Research output: Patent

ref. P-1568.010-US

Keywords

@misc{bb936392b16242b9bd9b8452a3f0cb78,

title = "Reticle masking system positioned below the reticle in a scanning lithography system",

keywords = "Octrooi",

author = "{Munnig Schmidt}, RH and G Schothorst and J. Eijk and E Loopstra and FGP Peeters",

note = "ref. P-1568.010-US; US 7,423,730 B2; ref. P-1568.010-US",

year = "2008",

language = "Undefined/Unknown",

type = "Patent",

}