The etching of silicon carbide in inductively coupled SF6/O-2 plasma

NOV Plank, MA Blauw, EWJM van der Drift, R Cheung

Research output: Contribution to journalArticleScientificpeer-review

60 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)482-487
Number of pages6
JournalJournal of Physics D: Applied Physics
Issue number5
Publication statusPublished - 2003


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