Transient tip-sample interactions in high-speed AFM imaging of 3D nano structures

Sasan Keyvani Janbahan, Hamed Sadeghian Marnani, Hans Goosen, Fred van Keulen

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

5 Citations (Scopus)
105 Downloads (Pure)


The maximum amount of repulsive force applied to the surface plays a very important role in damage of tip or sample in Atomic Force Microscopy(AFM). So far, many investigations have focused on peak repulsive forces in tapping mode AFM in steady state conditions. However, it is known that AFM could be more damaging in transient conditions. In high-speed scanning, and in presence of 3D nano structures (such as FinFET), the changes in topography appear in time intervals shorter than the response time of the cantilever. In this case, the tip may crush into the sample by exerting much higher forces than for the same cantilever-sample distance in steady state situations. In this study the effects of steep upward steps in topography on the tip-sample interactions have been investigated, and it has been found that the order(s) of magnitude higher forces can be applied. The information on the worst case scenario obtained by this method can be used for selection of operation parameters and probe design to minimize damage in high-speed imaging. The numerically obtained results have been verified with the previous works in steady state regime. Based on this investigation the maximum safe scanning speed has been obtained for a case study
Original languageEnglish
Title of host publicationMetrology, Inspection, and Process Control for Microlithography XXIX
EditorsJ.P. Cain, M.I. Sanchez
Place of PublicationBellingham, WA, USA
ISBN (Print)978-1-628415261
Publication statusPublished - 2015
EventMetrology, Inspection, and Process Control for Microlithography XXIX - San Jose, CA, United States
Duration: 23 Feb 201526 Feb 2015

Publication series

NameProceedings of SPIE
ISSN (Electronic)1605-7422


ConferenceMetrology, Inspection, and Process Control for Microlithography XXIX
CountryUnited States
CitySan Jose, CA


  • Tapping mode AFM
  • Tip-sample interactions
  • Peak repulsive Force
  • Hertz model
  • Contact stress


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