Backwafer optical lithography and wafer distortion in substrate transfer technologies

HW van Zeijl; JHCM Slabbekoorn; LK Nanver; PWL van Dijk; A Berthold; T Machielsen

Backwafer optical lithography and wafer distortion in substrate transfer technologies

HW van Zeijl, JHCM Slabbekoorn, LK Nanver, PWL van Dijk, A Berthold, T Machielsen

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

8 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	Proceedings of SPIE, vol. 4181
Editors	D Burnett, S Kimura, B Singh
Place of Publication	Bellingham
Publisher	International Society for Optical Engineering
Pages	200-207
Number of pages	8
ISBN (Print)	0-8194-3842-1
Publication status	Published - 2000
Event	Challenges in Process Integration and Device Technology, Santa Clara - Bellingham Duration: 18 Sept 2000 → 19 Sept 2000

Publication series

Name
Publisher	International Society for Optical Engineering

Conference

Conference	Challenges in Process Integration and Device Technology, Santa Clara
Period	18/09/00 → 19/09/00

Keywords

ZX Int.klas.verslagjaar < 2002

Cite this

@inproceedings{0b4ab21b8284445489bf6e59dfeefc03,

title = "Backwafer optical lithography and wafer distortion in substrate transfer technologies",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "{van Zeijl}, HW and JHCM Slabbekoorn and LK Nanver and {van Dijk}, PWL and A Berthold and T Machielsen",

year = "2000",

language = "Undefined/Unknown",

isbn = "0-8194-3842-1",

publisher = "International Society for Optical Engineering",

pages = "200--207",

editor = "{D Burnett} and {S Kimura} and {B Singh}",

booktitle = "Proceedings of SPIE, vol. 4181",

note = "Challenges in Process Integration and Device Technology, Santa Clara ; Conference date: 18-09-2000 Through 19-09-2000",

}

van Zeijl, HW, Slabbekoorn, JHCM, Nanver, LK, van Dijk, PWL, Berthold, A & Machielsen, T 2000, Backwafer optical lithography and wafer distortion in substrate transfer technologies. in D Burnett, S Kimura & B Singh (eds), Proceedings of SPIE, vol. 4181. International Society for Optical Engineering, Bellingham, pp. 200-207, Challenges in Process Integration and Device Technology, Santa Clara, 18/09/00.

Backwafer optical lithography and wafer distortion in substrate transfer technologies. / van Zeijl, HW; Slabbekoorn, JHCM; Nanver, LK et al.
Proceedings of SPIE, vol. 4181. ed. / D Burnett; S Kimura; B Singh. Bellingham: International Society for Optical Engineering, 2000. p. 200-207.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Backwafer optical lithography and wafer distortion in substrate transfer technologies

AU - van Zeijl, HW

AU - Slabbekoorn, JHCM

AU - Nanver, LK

AU - van Dijk, PWL

AU - Berthold, A

AU - Machielsen, T

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 0-8194-3842-1

SP - 200

EP - 207

BT - Proceedings of SPIE, vol. 4181

A2 - D Burnett, null

A2 - S Kimura, null

A2 - B Singh, null

PB - International Society for Optical Engineering

CY - Bellingham

T2 - Challenges in Process Integration and Device Technology, Santa Clara

Y2 - 18 September 2000 through 19 September 2000

ER -