Charged particle beam exposure system

P Kruit (Inventor)

    Research output: Patent

    Original languageEnglish
    Patent numberUS7868307
    IPCAanvrager: MAPPER Lithography B.V.
    Priority date11/01/11
    Publication statusPublished - 2011

    Bibliographical note

    Aanvrager: MAPPER Lithography B.V.

    Keywords

    • Octrooi

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