Electron beam induced deposited etch masks

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	961-964
Number of pages	4
Journal	Microelectronic Engineering
Volume	86
Issue number	4-6
Publication status	Published - 2009

Keywords

@article{92cffb13f3724c08aae4f345d716e867,

title = "Electron beam induced deposited etch masks",

keywords = "CWTS JFIS < 0.75",

author = "CTH Heerkens and MJ Kamerbeek and {van Dorp}, WF and CW Hagen and J Hoekstra",

year = "2009",

language = "Undefined/Unknown",

volume = "86",

pages = "961--964",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "4-6",

}