Electron beam induced deposited etch masks

CTH Heerkens, MJ Kamerbeek, WF van Dorp, CW Hagen, J Hoekstra

Research output: Contribution to journalArticleScientificpeer-review

21 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)961-964
Number of pages4
JournalMicroelectronic Engineering
Volume86
Issue number4-6
Publication statusPublished - 2009

Keywords

  • CWTS JFIS < 0.75

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