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Electron beam technology for single nanometer fabrication
Marijke Scotuzzi
Research output
:
Thesis
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Dissertation (TU Delft)
63
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INIS
cost
33%
deposition
33%
devices
100%
dimensions
33%
electron beams
100%
etching
33%
fabrication
100%
industry
33%
integrated circuits
33%
manufacturing
100%
nanotechnology
33%
polymers
100%
production
66%
range
33%
resist
33%
resolution
66%
substrates
66%
ultraviolet radiation
33%
volume
33%
wavelengths
33%
Engineering
Critical Dimension
25%
Electron Beam Technology
100%
Etching Process
25%
Gas Fuel Manufacture
50%
High Volume
25%
Integrated Circuit
25%
Nanometre
100%
Patterning Technique
25%
Substrates
50%
Throughput
25%
Wavelength
25%
Material Science
Devices
75%
Electronic Circuit
25%
Extreme-Ultraviolet Lithography
25%
Lithography
25%
Nanoimprint Lithography
100%
Shrinkage
25%