TY - JOUR
T1 - Extreme ultraviolet photoelectron spectroscopy on fluorinated monolayers
T2 - Towards nanolithography on monolayers
AU - Lugier, Olivier
AU - Troglia, Alessandro
AU - Sadegh, Najmeh
AU - van Kessel, Luc
AU - Bliem, Roland
AU - Mahne, Nicola
AU - Nannarone, Stefano
AU - Castellanos, Sonia
PY - 2020
Y1 - 2020
N2 - The semiconductor industry plans to keep fabricating integrated circuits, progressively decreasing there features size, by employing extreme ultraviolet lithography (EUVL). With this method, new designs and concepts for photoresist materials need to be conceived. In this work, we explore an alternative concept to the classic photoresist material by using an organic self-assembled monolayer (SAM) on a gold substrate. The monolayer, composed of a richly fluorinated thiol sensitive to low-energy electrons, is adsorbed on the Au substrate which acts as main EUV-absorber and as the source of photoelectrons and secondary electrons. We investigate the stability of the SAM adsorbed on gold towards EUV radiation by means of in-situ photoelectron spectroscopy. The photoelectron spectra indicate that the monolayer attenuates a significant amount of primary electrons generated in the gold layer. The spectral evolution upon EUV irradiation indicates that the SAM loses a significant amount of its initial fluorine content (ca. 40% at 200 mJ/cm2). We attribute these chemical changes mostly to the interaction with the electrons generated in the thiol/Au system.
AB - The semiconductor industry plans to keep fabricating integrated circuits, progressively decreasing there features size, by employing extreme ultraviolet lithography (EUVL). With this method, new designs and concepts for photoresist materials need to be conceived. In this work, we explore an alternative concept to the classic photoresist material by using an organic self-assembled monolayer (SAM) on a gold substrate. The monolayer, composed of a richly fluorinated thiol sensitive to low-energy electrons, is adsorbed on the Au substrate which acts as main EUV-absorber and as the source of photoelectrons and secondary electrons. We investigate the stability of the SAM adsorbed on gold towards EUV radiation by means of in-situ photoelectron spectroscopy. The photoelectron spectra indicate that the monolayer attenuates a significant amount of primary electrons generated in the gold layer. The spectral evolution upon EUV irradiation indicates that the SAM loses a significant amount of its initial fluorine content (ca. 40% at 200 mJ/cm2). We attribute these chemical changes mostly to the interaction with the electrons generated in the thiol/Au system.
KW - EUV Lithography
KW - Photoelectron spectroscopy
KW - Self-Assembled Monolayer
UR - http://www.scopus.com/inward/record.url?scp=85087361666&partnerID=8YFLogxK
U2 - 10.2494/photopolymer.33.229
DO - 10.2494/photopolymer.33.229
M3 - Article
AN - SCOPUS:85087361666
SN - 0914-9244
VL - 33
SP - 229
EP - 234
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
IS - 2
ER -