Lithographic alignment offset compensation for substrate transfer processes

HW van Zeijl; LK Nanver; FGC Bijnen; EJG Goudena; JHCM Slabbekoorn

Lithographic alignment offset compensation for substrate transfer processes

HW van Zeijl, LK Nanver, FGC Bijnen, EJG Goudena, JHCM Slabbekoorn

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Proceedings of the STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005)
Editors	s.n.
Place of Publication	Utrecht, The Netherlands
Publisher	STW
Pages	121-126
Number of pages	6
ISBN (Print)	90-73461-50-2
Publication status	Published - 2005
Event	STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005), Veldhoven, the Netherlands - Utrecht Duration: 17 Nov 2005 → 18 Nov 2005

Publication series

Name
Publisher	STW

Conference

Conference	STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005), Veldhoven, the Netherlands
Period	17/11/05 → 18/11/05

Bibliographical note

Editors onbekend, WPM/STW

Keywords

conference contrib. refereed
Vakpubl., Overig wet. > 3 pag

Cite this

@inproceedings{075615f132c84c66b0d90371c4c39436,

title = "Lithographic alignment offset compensation for substrate transfer processes",

keywords = "conference contrib. refereed, Vakpubl., Overig wet. > 3 pag",

author = "{van Zeijl}, HW and LK Nanver and FGC Bijnen and EJG Goudena and JHCM Slabbekoorn",

note = "Editors onbekend, WPM/STW; STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005), Veldhoven, the Netherlands ; Conference date: 17-11-2005 Through 18-11-2005",

year = "2005",

language = "Undefined/Unknown",

isbn = "90-73461-50-2",

publisher = "STW",

pages = "121--126",

editor = "s.n.",

booktitle = "Proceedings of the STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005)",

}

van Zeijl, HW, Nanver, LK, Bijnen, FGC, Goudena, EJG & Slabbekoorn, JHCM 2005, Lithographic alignment offset compensation for substrate transfer processes. in s.n. (ed.), Proceedings of the STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005). STW, Utrecht, The Netherlands, pp. 121-126, STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005), Veldhoven, the Netherlands, 17/11/05.

Lithographic alignment offset compensation for substrate transfer processes. / van Zeijl, HW; Nanver, LK; Bijnen, FGC et al.
Proceedings of the STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005). ed. / s.n. Utrecht, The Netherlands: STW, 2005. p. 121-126.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Lithographic alignment offset compensation for substrate transfer processes

AU - van Zeijl, HW

AU - Nanver, LK

AU - Bijnen, FGC

AU - Goudena, EJG

AU - Slabbekoorn, JHCM

N1 - Editors onbekend, WPM/STW

PY - 2005

Y1 - 2005

KW - conference contrib. refereed

KW - Vakpubl., Overig wet. > 3 pag

M3 - Conference contribution

SN - 90-73461-50-2

SP - 121

EP - 126

BT - Proceedings of the STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005)

A2 - s.n., null

PB - STW

CY - Utrecht, The Netherlands

T2 - STW annual workshop on semiconductor advances for future electronics and sensors (SAFE 2005), Veldhoven, the Netherlands

Y2 - 17 November 2005 through 18 November 2005

ER -