Nanomechanical resonators fabricated by atomic layer deposition on suspended 2D materials

H. Liu*, Saravana B. Basuvalingam, Saurabh Lodha, Ageeth A. Bol, Herre S.J. van der Zant, Peter G. Steeneken, Gerard J. Verbiest*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)
111 Downloads (Pure)

Abstract

Atomic layer deposition (ALD), a layer-by-layer controlled method to synthesize ultrathin materials, provides various merits over other techniques such as precise thickness control, large area scalability and excellent conformality. Here we demonstrate the possibility of using ALD growth on top of suspended 2D materials to fabricate nanomechanical resonators. We fabricate ALD nanomechanical resonators consisting of a graphene/MoS2 heterostructure. Using atomic force microscope indentation and optothermal drive, we measure their mechanical properties including Young’s modulus, resonance frequency and quality factor, showing a lower energy dissipation compared to their exfoliated counterparts. We also demonstrate the fabrication of nanomechanical resonators by exfoliating an ALD grown NbS2 layer. This study exemplifies the potential of ALD techniques to produce high-quality suspended nanomechanical membranes, providing a promising route towards high-volume fabrication of future multilayer nanodevices and nanoelectromechanical systems.

Original languageEnglish
Article number045023
Number of pages8
Journal2D Materials
Volume10
Issue number4
DOIs
Publication statusPublished - 2023

Keywords

  • atomic layer deposition
  • nanomechanical resonator
  • optomechanical drive
  • Q factor
  • resonance frequency

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