INIS
sputtering
100%
interfaces
100%
stoichiometry
100%
deposition
100%
films
60%
oxygen
40%
surfaces
20%
atmospheres
20%
substrates
20%
energy
20%
lasers
20%
x radiation
20%
transmission electron microscopy
20%
mixing
20%
titanium oxides
20%
vacancies
20%
high pressure
20%
Engineering
Flat Surface
100%
High Pressure
100%
Transmissions
100%
Oxygen Vacancy
100%
Pulsed Laser
100%
Substrates
100%
Energy Engineering
100%
Keyphrases
Conducting Interfaces
100%
Non-conductive Material
100%
Stoichiometry
100%
Elemental Ratios
50%
Energy Dispersive X-ray
50%
X-ray Techniques
50%
Oxygen Vacancy
50%
RF Sputtering
50%
Flat Surface
50%
Material Science
Film
100%
Sputter Deposition
100%
Protective Atmosphere
33%
Titanium Dioxide
33%
Oxygen Vacancy
33%
Transmission Electron Microscopy
33%
Surface
33%
Pulsed Laser Deposition
33%