Modulation device and charged particle multi-beamlet lithography system using the same

P. Kruit (Inventor), A.H. van Veen (Inventor)

Research output: Patent

Original languageEnglish
IPCH01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B
Priority date26/10/10
Publication statusPublished - 2012

Cite this