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Research Output

2010

Lithography system comprising dispenser cathode

Kruit, P. & Steenbrink, S., 2010, IPC No. Aanvrager: Mapper Lithography IP BV, Patent No. EP2267747 A1, Priority date 29 Dec 2010

Research output: Patent

Method of inspecting a specimen surface, apparatus and use of fluorescent material

Nijkerk, MD. & Kruit, P., 2010, IPC No. Aanvrager: TNO. Verleend., Patent No. US7732762 B2, Priority date 8 Jun 2010

Research output: Patent

Particle-optical apparatus equipped with a gas ion source

Kruit, P. & Tondare, VN., 2010, IPC No. Aanvrager: Fei Company, Patent No. US7772564 B2, Priority date 10 Aug 2010

Research output: Patent

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

Steenbrink, S. & Kruit, P., 2010, IPC No. Aanvrager: Mapper Lithography IP BV, Patent No. US2010219357 A1, Priority date 2 Sep 2010

Research output: Patent

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

Steenbrink, SWHK. & Kruit, P., 2010, IPC No. Aanvrager: Mapper Lithography IP B.V., Patent No. US7710009 B2, Priority date 4 May 2010

Research output: Patent

2009

Apparatus for generating a plurality of beamlets

Kruit, P., 2009, IPC No. Aanvrager: Mapper Lithography IP B.V., Patent No. US 7,569,833 B2, Priority date 4 Aug 2009

Research output: Patent

Concept and operation of Schottky emitter without suppressor electrode

Dokania, AK. & Kruit, P., 2009, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 27, 6, p. 2426-2431 6 p.

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)

Directed assembly of nano particles with the help of charge patterns created with scanning electron microscope

Zonnevylle, AC., Hagen, CW., Kruit, P. & Schmidt-Ott, A., 2009, In : Microelectronic Engineering. 86, 4-6, p. 803-805 3 p.

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)

Electron optics of skewed micro-Einzel lenses

van Bruggen, MJ., van Someren, B. & Kruit, P., 2009, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 27(1), Jan/Feb, p. 139-147 9 p.

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)

Improving the energy spread and brightness of thermal-field (Schottky) emitters with PHAST-Photo assisted Schottky tip

Cook, BJ., Bronsgeest, MS., Hagen, CW. & Kruit, P., 2009, In : Ultramicroscopy. 109, 5, April 2009, p. 403-412 10 p.

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)

Lithography system

Wieland, MJJ., van 't Spijker, JC., Jager, R. & Kruit, P., 2009, IPC No. Aanvrager: Mapper Lithography IP B.V., Patent No. US 7,612,866 B2, Priority date 3 Nov 2009

Research output: Patent

Lithography system, method of clamping an wafer table

de Boer, G., Dansberg, MP. & Kruit, P., 2009, IPC No. Heeft nieuwheidsrapport. Aanvrager: Mapper Lithography IP B.V., Patent No. US2009/0027649 A1, Priority date 29 Jan 2009

Research output: Patent

Method and apparatus for imaging

van Someren, B. & Kruit, P., 2009, IPC No. Heeft nieuwheidsrapport. Aanvrager: TU Delft, Patent No. US2009/0180192 A1, Priority date 16 Jul 2009

Research output: Patent

On the influence of the sputtering in determining the resolution of a Scanning Ion Microscope

Castaldo, V., Hagen, CW., Kruit, P., Veldhoven, E. V. & Maas, D., 2009, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 27, 6, p. 3196-3202 7 p.

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)

Optimization of focused ion beam performance

Hagen, CW. & Kruit, P., 2009, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 27, 6, p. 2654-2659 6 p.

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Projection lens arrangement

Wieland, MJJ., Kampherbeek, BJ., van Veen, A. H., Kruit, P. & Steenbrink, S. W. H. K., 2009, IPC No. heeft nieuwheidsrapport. Aanvrager: Mapper Lithography IP B.V., Patent No. US2009/0261267 A1, Priority date 22 Oct 2009

Research output: Patent

Projection Lens arrangement

Wieland, MJJ., Kampherbeek, BJ., van Veen, A. H., Kruit, P. & Steenbrink, S. W. H. K., 2009, IPC No. H01L, B82Y, H01J, G03F, G01J, G21K, Priority date 28 Feb 2008, Priority No. WO 2009106397 A1

Research output: Patent

Railway infrastructure

Kruit, P., van Overbeek, F. & Gravendeel, B., 2009, IPC No. Aanvrager: TU Delft. Incl. nieuwheidsrapport, Patent No. EP2017118 A1, Priority date 21 Jan 2009

Research output: Patent

Reversible shape changes of the end facet on Schottky electron emitters

Bronsgeest, MS. & Kruit, P., 2009, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 27, 6, p. 2524-2531 8 p.

Research output: Contribution to journalArticleScientificpeer-review

7 Citations (Scopus)

Spoorweginfrastructuur

Kruit, P., van Overbeeke, F. & Gravendeel, B., 2009, IPC No. Aanvrager: TU Delft, Patent No. 2000756, Priority date 20 Jan 2009

Research output: Patent

Transformation of polycrystalline tungsten to monocrystalline tungsten W(100) and its potential application in Schottky emitters

Dokania, AK., Hendrikx, R. & Kruit, P., 2009, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 27, Jan/Feb, p. 122-125 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Verringerung von DC-Magnetfeldern bei Straßenbahnen

van Overbeeke, F., Gravendeel, B., Kruit, P. & van der Sluis, L., 2009, In : Elektrische Bahnen: Elektrotechnik im Verkehrswesen. 12, 2009, p. 522-529 8 p.

Research output: Contribution to journalArticleScientificpeer-review

2008

Apparatus for generating a plurality of beamlets ¿ Aligned aperture lens

Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. US 7,365,338, Priority date 29 Apr 2008

Research output: Patent

Apparatus for generating a plurality of beamlets ¿ Proportional deflections

Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. US 7,391,037, Priority date 24 Jun 2008

Research output: Patent

Apparatus for generating a plurality of beamlets ¿ Spatial filter

Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. US 7,348,567, Priority date 25 Mar 2008

Research output: Patent

Brightness measurements of a Gallium liquid metal ion source

Hagen, CW., Fokkema, E. & Kruit, P., 2008, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 26, 6, p. 2091-2096 6 p.

Research output: Contribution to journalArticleScientificpeer-review

19 Citations (Scopus)

Charged particle beam exposure system ¿ Redundancy scan

Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. US 7,453,075, Priority date 18 Nov 2008

Research output: Patent

Design of a high brightness multi-electron beam source

Zhang, Y. & Kruit, P., 2008, Proceedings of the Seventh International Conference on Charged Particle Optics. Munro, E. & Rouse, J. (eds.). London, U.K.: Elsevier, p. 553-563 11 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

10 Citations (Scopus)

Dispenser cathode

Steenbreek, STWH. & Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. EP 1593140, Priority date 20 Aug 2008

Research output: Patent

Effect of the electric field on the form stability of a Schottky electron emitter: a step model

Bronsgeest, MS. & Kruit, P., 2008, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 26, 6, p. 2073-2079 7 p.

Research output: Contribution to journalArticleScientificpeer-review

8 Citations (Scopus)

Electronic Pathways in Nanostructure Fabrication

Hagen, CW., van Dorp, WF., A. Crozier, P. & Kruit, P., 2008, In : Surface Science. 602, p. 3212-3219 8 p.

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)

Electron optics of microlenses with inclined beams

Zhang, Y., Barth, JE. & Kruit, P., 2008, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 26, 2, p. 655-660 6 p.

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)

Fabrication of miniaturized Schottky emitter by wire electrical discharge methode (WEDM)

Dokania, AK., Pelle, M. & Kruit, P., 2008, In : Microelectronic Engineering. 85, 5-6, p. 1031-1034 4 p.

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)

Lens array for electron beam lithography tool

Katsap, V., Kruit, P., Moonen, D. & Waskiewicz, WK., 2008, IPC No. aangevraagd door Agere Systems Inc, Allentown, PA, USA, Patent No. US 7,345,290, Priority date 18 Mar 2008

Research output: Patent

Lithography system, method of heat dissipation and frame

Kruit, P., Dansberg, MP. & Wieland, MJJ., 2008, IPC No. Applicant: Mapper Lithography IP BV, Patent No. WO 2008013443 A2, Priority date 31 Jan 2008

Research output: Patent

MAPPER: high throughput maskless lithography

Slot, E., Wieland, M. J. J., de Boer, G., Kruit, P. & ten Berge, GF., 2008, In : Proceedings of SPIE- International Society for Optical Engineering. 6921, p. 69211P-1-69211P-9

Research output: Contribution to journalConference articleScientificpeer-review

62 Citations (Scopus)

Multiple beam charged particle optical system

van Bruggen, MJ. & Kruit, P., 2008, IPC No. Applicant: Mapper Lithography IP BV, Patent No. WO 2008013442 A1, Priority date 31 Jan 2008

Research output: Patent

Probe current, probe size, and the practical brightness for probe forming systems

Bronsgeest, MS., Barth, JE., Swanson, LW. & Kruit, P., 2008, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 26, 3, p. 949-955 7 p.

Research output: Contribution to journalArticleScientificpeer-review

46 Citations (Scopus)

Reliability study of RTV 566 for its application as a ¿Spring¿

Dokania, AK. & Kruit, P., 2008, In : IEEE Transactions on Device and Materials Reliability. 8, 1, p. 229-233 5 p.

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)

Space charge and statistical coulomb effects

Kruit, P. & Jansen, GH., 2008, Handbook of Charged Particle Optics. Orloff, J. (ed.). College Park: University of Maryland, p. 341-391 680 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeChapterScientific

13 Citations (Scopus)

Synthesis of nanostructures using electron beam induced deposition

Kruit, P., van Dorp, WF., Hagen, CW. & A. Crozier, P., 2008, In : Microscopy and Microanalysis. 14, SUPPL.2, p. 242-243 2 p.

Research output: Contribution to journalArticleScientificpeer-review

2007

10 nm lines and spaces written in HSQ using electron beam lithography

Grigorescu, AE., van der Krogt, MC., Hagen, CW. & Kruit, P., 2007, In : Microelectronic Engineering. 84, p. 822-824 3 p.

Research output: Contribution to journalArticleScientificpeer-review

75 Citations (Scopus)

Cathode Ray tube type electron gun as a source for multibeam electron lithography

van den Brom, AJ., van Veen, AHV., Weeda, WM., Berglund, GZM., Wieland, M. J. J. & Kruit, P., 2007, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 25, 6, p. 2245-2249 5 p.

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)

Extracting the Boersch effect contribution from experimental energy spread measurements for Schottky electron emitters

Bronsgeest, MS., Barth, JE., Schwind, GA., Kruit, P. & Swanson, LW., 2007, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 25, 6, p. 2049-2054 6 p.

Research output: Contribution to journalArticleScientificpeer-review

16 Citations (Scopus)

High brightness 100-electron-beam-source for high resolution applications

Zhang, Y. & Kruit, P., 2007, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 25, 6, p. 2239-2244 6 p.

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)

High throughput defect detection with multiple parallel beams

Himbergen, HMP., Nijkerk, M. D., Jager, de, P. W. H., Hosman, TC. & Kruit, P., 2007, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 25, 6, p. 2521-2525 5 p.

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)